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Wafer Fabrication Monitoring/Control System and Method

Uses Multiple Internal Reflection Infrared Spectroscopy (MIR-IR) as a tool to guide the development of cleans-friendly plasma etches

Published: 2nd July 2021
Wafer Fabrication Monitoring/Control System and Method
Aleksandr Matveev, https://stock.adobe.com/427992734, stock.adobe.com
IP Status
  • Patented
  • Know-how based
Seeking
  • Licensing
  • Commercial partner